Beilstein J. Nanotechnol.2020,11, 1371–1380, doi:10.3762/bjnano.11.121
into an independent field of science [2]. This shows that understanding wetting phenomena is crucial for a variety of industrial processes and research fields. In microtechnology, the dispersion of organicphotoresists on substrates is indispensable for lithographic top-down microstructuring, yielding
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Figure 1:
Derivative of the free energy as a function of the film thickness for (a) gold on silicon oxide and...
Beilstein J. Nanotechnol.2017,8, 784–788, doi:10.3762/bjnano.8.81
reduction of the surface roughness was observed as compared to the 325 nm light. These results indicate that even wavelengths above 325 nm can cause surface roughness improvements without notably changing the structure of the photoresist.
Keywords: near-field etching; organicphotoresists; surface
single-photon absorption but the former has a much lower probability [14][15].
The photoresist in this study is a conventional, organic, chemically amplified resist (CAR) (EPIC 2096 ArF Photoresist), which is sensitive to ArF excimer laser excitation (λ = 193 nm). Organicphotoresists are easily obtained
-product. Furthermore, since near-field etching has only been tested on nonorganic, flat materials and nonpatterned organic materials, it is of great interest to observe the near-field etching effect on organicphotoresists.
Experimental
For the purpose of this study, a positive tone organic photoresist
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Figure 1:
AFM images of the photoresist after 120 min of near-field etching with a He–Cd laser (325 nm, 3.81 ...